Main Kuumbwa
Composition | Zviri mukati | CAS Nha. | EC Nha. |
Mvura yakachena | 90-92% | 7732-18-5 | 231-791-2 |
Sodium carbonate | 1.0-3.0% | 5968-11-6 | 207-838-8 |
Acrylic block branched compound | 1.0-2.0% | / | / |
Surfactant | 1.0-1.5% | 25155-30-0 | 246-680-4 |
Preservative acid | 0.1% -1.5% | 137-40-6 | 205-290-4 |
Features
1. Yakakwirira kuchengetedzwa kwezvakatipoteredza: etching yakasarudzwa inogona kuwanikwa pasina kushandisa organic bases seTMAH;
2. Mutengo wakaderera wekugadzira: Kuenzaniswa neyakajairwa pretreatment uchishandisa hydrofluoric acid / nitric acid pamusika, mutengo wekugadzira unoderedzwa zvakanyanya;
3. High etching etching performance: Kuenzaniswa nePerc bhatiri process, kushanduka kwekushandura kunowedzera nekupfuura 1.2%;
Wafer size | Chitarisiko | Photoelectric shanduko | Hupenyu |
210 | Iyo etching surface yakajairika uye iyo yakanaka firimu haina ngura. | 24.4% ~ 24.6% | 240+ |
Technical Parameters
/L Kutanga kugovera mvura
| /L Liquid infusion | /L Kupindira-kudonha | Tembiricha/dhigirii | Reaction time/second | |
48%KOH | 8~10 | 0.3~0.45 | 5~7 | 63~64 | 100-200 |
Kuwedzera JH2570 | 2.0~4.0 | 0.18~0.21 | |||
Mvura yakachena | 440.0 | / |
Izvi zvivakwa zvinogona kusiyana zvichienderana neiyo imwe crystal wafer, maitiro, batch, uye saizi.
Applications
1, Ichi chigadzirwa chine chinangwa chekubvisa amorphous silicon coating kubva kumaseru etopcon;
2, Inokodzera monocrystalline masero e210, 186, 166, uye 158 tsanangudzo.
Product Features
Aihwa.
| Parameter
| Main parameters uye zviratidzo zveprojekiti |
1 | Ruvara, chimiro | Mvura isina ruvara kuenda kuyero inoonekera |
2 | PH kukosha | 7.0-10.0 |
3 | density | 1.05-1.5g/ml |
4 | Kuchengetedza mamiriro | Chengetedza pakamuri tembiricha kure nechiedza |